Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering

Won Young Choi, Hyun Woo Bang, Seung Hyun Chun, Sunghun Lee, Myung Hwa Jung

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness.

Original languageEnglish
Article number7
JournalNanoscale Research Letters
Volume16
Issue number1
DOIs
StatePublished - 2021

Bibliographical note

Publisher Copyright:
© 2021, The Author(s).

Keywords

  • MnSi
  • Polycrystal
  • Skyrmion
  • Sputtering
  • Topological Hall effect

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