Abstract
Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness.
Original language | English |
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Article number | 7 |
Journal | Nanoscale Research Letters |
Volume | 16 |
Issue number | 1 |
DOIs | |
State | Published - 2021 |
Bibliographical note
Publisher Copyright:© 2021, The Author(s).
Keywords
- MnSi
- Polycrystal
- Skyrmion
- Sputtering
- Topological Hall effect