Chemical vapor deposition of graphene and its characterizations and applications

Jungtae Nam, Jing Yang, Yue Zhao, Keun Soo Kim

Research output: Contribution to journalReview articlepeer-review

5 Scopus citations

Abstract

Chemical vapor deposition (CVD) plays a crucial role in reactions at the atomic and molecular levels, facilitating the growth of thin material layers and synthesizing various nano-electronic materials. This review focuses primarily on graphene as a representative example. The control of graphene properties is a significant and appealing aspect of graphene research. Graphene can be derived from natural graphite or artificially synthesized, with the latter offering relatively easier access and more straightforward property manipulation. This review delves into the intricate effects of doping and grain boundaries on CVD graphene properties, emphasizing modifications in atomic and electronic structures induced by nitrogen and boron dopants. In the case of single crystal CVD graphene, we have reviewed the transport properties of graphene devices, highlighting their extraordinarily high electronic quality comparable to exfoliated counterparts. In addition, in the final section, we briefly explore some representative application cases leveraging the unique advantages of large-area graphene.

Original languageEnglish
Pages (from-to)55-70
Number of pages16
JournalCurrent Applied Physics
Volume61
DOIs
StatePublished - May 2024

Bibliographical note

Publisher Copyright:
© 2024 The Authors

Keywords

  • Characterizations
  • Chemical vapor deposition
  • Doping
  • Graphene
  • Nanomaterials

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